Automatic Wafer-Processing

Automatic Wafer-Processing

The Apollo system product line sets new benchmarks in productivity and cost effectiveness. Designed for high volume wafer-based production, our Semi-S2 certified Apollo systems integrate the high productivity of SMFD-ALD with a revolutionary simple substrate handling. The result is a flexible, modular system that can be easily configured to our customers needs.

The Apollo system incorporates many patented and patent-pending innovations that deliver un-paralleled capabilities and productivity at the lowest cost of ownership.

Please contact the sales team at Forge Nano for more information.

Features and Benefits:

  • High throughput per substrate
  • Low Maintenance with up time matching and exceeding legacy CVD equipment
  • Low consumables cost- up to 90% precursor utilization efficiency
  • Semi S2 and UTL certified.
  • Integrated sub-atmospheric abatement for Zero-Waste process and long pump lifetime
  • Patented long lifetime ALD valves with over 100 million trouble-free cycles
  • Integrated millisecond response ALD valves manifold for composite films deposition with no throughput penalty
  • Flexible and scalable system configuration
  • Low cost of ownership with over 75% cost savings in most applications
  • Small equipment footprint


  • Thick film deposition ( >5 micron)
  • Short ALD cycle times (0.4-1 sec)
  • Low temperature processing (down to 80 °C)
  • 100% conformal films over any substrate topology
  • Seamless incorporation of nano-laminates with reproducible atomic-layer control
  • Composite ternary and quaternary alloy films with no throughput penalty