Manufacturers in a large number of industries are seeking cost-effective equipment that can lay down uniform, conformal and low-defect films with atomic-level, reproducible and robust control. As device manufacturing complexity keeps increasing, the need to deposit high quality films on complex three-dimensional shapes and area-enhanced surfaces intensifies, causing an escalation in associated cost.
Sundew’s suite of patented equipment, components and process innovations deliver unmatched productivity and uncompromising ALD performance at the lowest cost of ownership. We achieve this by addressing all aspects of ALD productivity.
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|Strategies for high productivity ALD|
|How ALD compares with other deposition techniques|
|Atomic Layer Deposition (ALD) Environmental Coatings for GaAs MMICs|